Numerical simulation of the deposition process and the epitaxial growth of cadmium telluride thin film in a MOCVD reactor

Xiaogang Yang, Yiyi Wu, Xiaobing Huang, Vincent Barrioz, Giray Kartopu, Shafiul Monir, Stuart J.C. Irvine

Research output: Journal PublicationArticlepeer-review

3 Citations (Scopus)

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Keyphrases

Material Science

Chemical Engineering