Laser surface cleaning of organic contaminants

Y. Feng; Z. Liu; R. Vilar; X. S. Yi

doi:10.1016/S0169-4332(99)00237-8

Laser surface cleaning of organic contaminants

Y. Feng, Z. Liu, R. Vilar, X. S. Yi

Research output: Journal Publication › Article › peer-review

29 Citations (Scopus)

Abstract

Laser surface cleaning process has been a useful and efficient technique for various industrial applications. The removal of photoresist contaminants on silicon wafers was investigated with a krypton fluoride (KrF) excimer laser, and the irradiated area was characterized using a profilometer, a scanning electronic microscopy (SEM), an Auger electron spectroscopy (AES) and a Fourier transition infrared spectroscopy (FT-IR). It was found that there exist an optimal number of pulses to remove the contaminant from the substrate surface without any laser-induced damage, depending on the laser density on the surface. A model to predict the optimal number of pulses, which agrees well with Beer-Lambert's law, is proposed and proved to be operable.

Original language	English
Pages (from-to)	131-136
Number of pages	6
Journal	Applied Surface Science
Volume	150
Issue number	1
DOIs	https://doi.org/10.1016/S0169-4332(99)00237-8
Publication status	Published - 11 Aug 1999
Externally published	Yes

ASJC Scopus subject areas

General Chemistry
Condensed Matter Physics
General Physics and Astronomy
Surfaces and Interfaces
Surfaces, Coatings and Films

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10.1016/S0169-4332(99)00237-8

Cite this

Feng, Y., Liu, Z., Vilar, R., & Yi, X. S. (1999). Laser surface cleaning of organic contaminants. Applied Surface Science, 150(1), 131-136. https://doi.org/10.1016/S0169-4332(99)00237-8

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abstract = "Laser surface cleaning process has been a useful and efficient technique for various industrial applications. The removal of photoresist contaminants on silicon wafers was investigated with a krypton fluoride (KrF) excimer laser, and the irradiated area was characterized using a profilometer, a scanning electronic microscopy (SEM), an Auger electron spectroscopy (AES) and a Fourier transition infrared spectroscopy (FT-IR). It was found that there exist an optimal number of pulses to remove the contaminant from the substrate surface without any laser-induced damage, depending on the laser density on the surface. A model to predict the optimal number of pulses, which agrees well with Beer-Lambert's law, is proposed and proved to be operable.",

author = "Y. Feng and Z. Liu and R. Vilar and Yi, {X. S.}",

note = "Funding Information: Partial support for this study is gratefully acknowledged from the National Doctoral Research Foundation of the State Education Commission of China, and the China–Portugal Scientific Cooperation Program.",

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AU - Feng, Y.

AU - Liu, Z.

AU - Vilar, R.

AU - Yi, X. S.

N1 - Funding Information: Partial support for this study is gratefully acknowledged from the National Doctoral Research Foundation of the State Education Commission of China, and the China–Portugal Scientific Cooperation Program.

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Y1 - 1999/8/11

N2 - Laser surface cleaning process has been a useful and efficient technique for various industrial applications. The removal of photoresist contaminants on silicon wafers was investigated with a krypton fluoride (KrF) excimer laser, and the irradiated area was characterized using a profilometer, a scanning electronic microscopy (SEM), an Auger electron spectroscopy (AES) and a Fourier transition infrared spectroscopy (FT-IR). It was found that there exist an optimal number of pulses to remove the contaminant from the substrate surface without any laser-induced damage, depending on the laser density on the surface. A model to predict the optimal number of pulses, which agrees well with Beer-Lambert's law, is proposed and proved to be operable.

AB - Laser surface cleaning process has been a useful and efficient technique for various industrial applications. The removal of photoresist contaminants on silicon wafers was investigated with a krypton fluoride (KrF) excimer laser, and the irradiated area was characterized using a profilometer, a scanning electronic microscopy (SEM), an Auger electron spectroscopy (AES) and a Fourier transition infrared spectroscopy (FT-IR). It was found that there exist an optimal number of pulses to remove the contaminant from the substrate surface without any laser-induced damage, depending on the laser density on the surface. A model to predict the optimal number of pulses, which agrees well with Beer-Lambert's law, is proposed and proved to be operable.

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Laser surface cleaning of organic contaminants

Abstract

ASJC Scopus subject areas

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