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Properties of the interfacial layer in the high-k gate stack and transistor performance
G. Bersuker, J. Peterson, J. Barnett, A. Korkin, J. H. Sim, R. Choi, B. H. Lee, J. Greer, P. Lysaght, H. R. Huff
Research output: Contribution to conference › Paper › peer-review
13
Citations
(Scopus)