TY - JOUR
T1 - Gallate-based metal–organic frameworks for the selective removal of trace ammonia via hydrogen bond engineering
AU - Wu, Peng
AU - Shao, Zai Dong
AU - Chen, George Z.
AU - He, Jun
AU - Zheng, Yu Ming
N1 - Publisher Copyright:
© 2025
PY - 2025/11/18
Y1 - 2025/11/18
N2 - Ammonia (NH3) is a prevalent indoor pollutant, particularly in semiconductor cleanrooms, where it is essential to adhere to stringent regulations that maintain concentration levels below parts per million (ppm). The development of sustainable adsorbents exhibiting high selectivity and adsorption capacity for NH3 at low partial pressures constitutes a critical yet challenging endeavor within this field. Herein, we introduce a class of isostructural gallate-based metal–organic frameworks (M−GA MOFs, M = Co, Mg, and Mn) endowed with abundant hydrogen bond donors within the pore channels. Notably, the Co-GA MOF exhibits an exceptionally high NH3 uptake of 3 mmol g−1 at an ultralow pressure of 0.001 mbar, surpassing all previously reported MOFs. Density-functional theory (DFT), independent gradient model based on Hirshfeld partition (IGMH), and quantum theory of atoms in molecules (QTAIM) analyses reveal the presence of strong O-H···N and N-H···O hydrogen bonds between NH3 and the MOF framework. These interactions, combined with van der Waals forces, contributed to exceptional NH3 selectivity over CO2 and N2, with selectivity exceeding 104 for NH3/CO2 = 0.1 %:99.9 %. Breakthrough experiments validate the exceptional removal performance of Co-GA MOFs for trace amounts of NH3, with a breakthrough point observed at 14 d g−1 for a concentration of 10 ppm NH3. This work not only advances our understanding of ultralow-pressure gas separation mechanisms but also offers a scalable solution for efficient separation and purification of trace contaminants in environmentally relevant settings.
AB - Ammonia (NH3) is a prevalent indoor pollutant, particularly in semiconductor cleanrooms, where it is essential to adhere to stringent regulations that maintain concentration levels below parts per million (ppm). The development of sustainable adsorbents exhibiting high selectivity and adsorption capacity for NH3 at low partial pressures constitutes a critical yet challenging endeavor within this field. Herein, we introduce a class of isostructural gallate-based metal–organic frameworks (M−GA MOFs, M = Co, Mg, and Mn) endowed with abundant hydrogen bond donors within the pore channels. Notably, the Co-GA MOF exhibits an exceptionally high NH3 uptake of 3 mmol g−1 at an ultralow pressure of 0.001 mbar, surpassing all previously reported MOFs. Density-functional theory (DFT), independent gradient model based on Hirshfeld partition (IGMH), and quantum theory of atoms in molecules (QTAIM) analyses reveal the presence of strong O-H···N and N-H···O hydrogen bonds between NH3 and the MOF framework. These interactions, combined with van der Waals forces, contributed to exceptional NH3 selectivity over CO2 and N2, with selectivity exceeding 104 for NH3/CO2 = 0.1 %:99.9 %. Breakthrough experiments validate the exceptional removal performance of Co-GA MOFs for trace amounts of NH3, with a breakthrough point observed at 14 d g−1 for a concentration of 10 ppm NH3. This work not only advances our understanding of ultralow-pressure gas separation mechanisms but also offers a scalable solution for efficient separation and purification of trace contaminants in environmentally relevant settings.
KW - Ammonia adsorption
KW - Hydrogen bonding interactions
KW - Metal-organic frameworks (MOFs)
KW - Selective gas separation
UR - http://www.scopus.com/inward/record.url?scp=105005186060&partnerID=8YFLogxK
U2 - 10.1016/j.seppur.2025.133529
DO - 10.1016/j.seppur.2025.133529
M3 - Article
AN - SCOPUS:105005186060
SN - 1383-5866
VL - 373
JO - Separation and Purification Technology
JF - Separation and Purification Technology
M1 - 133529
ER -