@inproceedings{dbc01c88a26545d0a55a98b580bedc9e,
title = "CFD modelling of cadmium telluride (CdTe) thin film coating with inline AP-MOCVD",
abstract = "A CFD numerical model has been established to study the growth of cadmium telluride (CdTe) on substrate using metalorganic chemical vapour deposition technique in atmospheric pressure (AP-MOCVD) and hydrodynamics in an inline MOCVD reactor. The numerical simulations have been conducted using the CFD code - ANSYS Fluent. Dimethylcadmium (DMCd) and diisopropyltelluride (DIPTe) have been employed as precursors while H2 is acting as the carrier gas. In order to assess the effect of various conditions on CdTe film growth and uniformity, heat transfer and mass transport behaviours of the chemical species in the reactor have been fully investigated. In addition, material utilization and fluid dynamics in the reactor are also discussed.",
keywords = "AP-MOCVD, CFD modelling, Cadmium telluride, Fluid dynamic, Thin film coating",
author = "Yiyi Wu and Xiaogang Yang and Xiaobing Huang and Vincent Barrioz and Shafiul Monir and Stuart Irvine and Giray Kartopu",
note = "Copyright: Copyright 2012 Elsevier B.V., All rights reserved.; 2nd International Conference on Advanced Design and Manufacturing Engineering, ADME 2012 ; Conference date: 16-08-2012 Through 18-08-2012",
year = "2012",
doi = "10.4028/www.scientific.net/AMM.217-219.1265",
language = "English",
isbn = "9783037855027",
series = "Applied Mechanics and Materials",
pages = "1265--1273",
booktitle = "Advanced Materials and Process Technology",
}