Layered Al2O3-SiO2 and Al2O3-Ta2O5 thin-film composites for high dielectric strength, deposited by pulsed direct current and radio frequency magnetron sputtering

Benjamin V.T. Hanby, Bryan W. Stuart, Miquel Gimeno-Fabra, Jonathan Moffat, Chris Gerada, David M. Grant

Research output: Journal PublicationArticlepeer-review

9 Citations (Scopus)

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