Contributions of chemical interactions and mechanical interlocking for the adhesion of electroplated copper to ABS in the Cr(VI) etching process

Ran Tao, Lujain Fatta, Ruslan Melentiev, Amit K. Tevtia, Gilles Lubineau

Research output: Journal Publication › Article › peer-review

11 Citations (Scopus)

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Material Science

Chemical Engineering

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Engineering