Simulating the atomic layer deposition of alumina from first principles

Engineering & Materials Science

• Atomic layer deposition 100%
• Alumina 64%
• Hydroxylation 19%
• Chemisorption 16%
• Density functional theory 16%
• Oxide films 13%
• Chemical vapor deposition 12%
• Desorption 12%
• Aluminum oxide 10%
• Capacitors 8%
• Display devices 8%
• Substrates 7%
• Data storage equipment 6%
• Water 5%
• Temperature 4%

Chemical Compounds

• Atomic Layer Epitaxy 75%
• Dissociative Chemisorption 15%
• Surface 13%
• Deposition Technique 11%
• Electroluminescence 11%
• Capacitor 11%
• Chemical Vapour Deposition 9%
• Desorption 8%
• Density Functional Theory 6%
• Oxide 5%
• Liquid Film 5%