Semi-metal nanowire transistors from first principle calculations

L. Ansari, G. Fagas, J. C. Greer

Research output: Chapter in Book/Conference proceedingConference contributionpeer-review

1 Citation (Scopus)

Abstract

Bandgap engineering in semimetal nanowires can be utilized to form a field effect transistor (FET) near atomic dimensions and eliminates the need for doping in the transistor's source, channel, or drain. For sufficiently small wire diameters the metallic behaviour of the semimetal is lost and a bandgap is induced. Using a full quantum mechanical description of the semimetal nanowires, we were able to demonstrate the design of a dopant-free, monomaterial confinement modulated gap transistors (CMGTs) which unlike conventional FETs do not require dopant atoms to define different device regions. This overcomes a primary obstacle to fabricating sub-5 nm transistors, enabling aggressive scaling to near atomic limits.

Original languageEnglish
Title of host publicationGraphene, Ge/III-V, and Emerging Materials for Post CMOS Applications 5
Pages259-267
Number of pages9
Edition1
DOIs
Publication statusPublished - 2013
Externally publishedYes
Event5th International Symposium on Graphene, Ge/III-V and Emerging Materials For Post-CMOS Applications - 223rd ECS Meeting - Toronto, ON, Canada
Duration: 12 May 201317 May 2013

Publication series

NameECS Transactions
Number1
Volume53
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Conference

Conference5th International Symposium on Graphene, Ge/III-V and Emerging Materials For Post-CMOS Applications - 223rd ECS Meeting
Country/TerritoryCanada
CityToronto, ON
Period12/05/1317/05/13

ASJC Scopus subject areas

  • General Engineering

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