Laser surface cleaning of organic contaminants

Y. Feng, Z. Liu, R. Vilar, X. S. Yi

Research output: Journal PublicationArticlepeer-review

24 Citations (Scopus)

Abstract

Laser surface cleaning process has been a useful and efficient technique for various industrial applications. The removal of photoresist contaminants on silicon wafers was investigated with a krypton fluoride (KrF) excimer laser, and the irradiated area was characterized using a profilometer, a scanning electronic microscopy (SEM), an Auger electron spectroscopy (AES) and a Fourier transition infrared spectroscopy (FT-IR). It was found that there exist an optimal number of pulses to remove the contaminant from the substrate surface without any laser-induced damage, depending on the laser density on the surface. A model to predict the optimal number of pulses, which agrees well with Beer-Lambert's law, is proposed and proved to be operable.

Original languageEnglish
Pages (from-to)131-136
Number of pages6
JournalApplied Surface Science
Volume150
Issue number1
DOIs
Publication statusPublished - 11 Aug 1999
Externally publishedYes

ASJC Scopus subject areas

  • Chemistry (all)
  • Condensed Matter Physics
  • Physics and Astronomy (all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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