Construction of a binary S-scheme S-g-C3N4/Co-ZF heterojunction with enhanced spatial charge separation for sunlight-driven photocatalytic performance

Ali Bahadur, Shahid Iqbal, Mohsin Javed, Syeda Saba Hassan, Sohail Nadeem, Ali Akbar, Rami M. Alzhrani, Murefah Mana Al-Anazy, Eslam B. Elkaeed, Nasser S. Awwad, Hala A. Ibrahium, Ayesha Mohyuddin

Research output: Journal PublicationArticlepeer-review

7 Citations (Scopus)

Abstract

A step-scheme (S-scheme) photocatalyst made of sulfurized graphitic carbon nitride/cobalt doped zinc ferrite (S-g-C3N4/Co-ZF) was constructed using a hydrothermal process because the building of S-scheme systems might increase the lifespan of highly reactive charge carriers. Utilizing cutting-edge methods, the hybrid photocatalyst was evaluated by employing TEM, XPS, XRD, BET, FTIR, transient photo-response, UV-vis, EIS and ESR signals. In order to create a variety of binary nanocomposites (NCs), nanoparticles (NPs) of 6% cobalt doped zinc ferrite (Co-ZF) were mixed with S-g-C3N4 at various concentrations, ranging from 10 to 80 wt%. For photocatalytic dye removal, a particular binary NC constructed between S-g-C3N4 and Co-ZF produces a huge amount of catalytic active sites. The findings showed that loading of S-g-C3N4 on 6% Co-ZF NPs serves as a good heterointerface for e/h+ separation and transportation through the S-scheme S-g-C3N4/Co-ZF heterojunction. By boosting the hybrid system's BET surface area for the photocatalytic process, the addition of 6% Co-ZF improves the system's ability to absorb more sunlight and boosts its photocatalytic activity. The highest photo-removal effectiveness (98%), which is around 2.45 times higher than that of its competitors, was achieved by the hybrid photocatalyst system with an ideal loading of 48% Co-ZF.

Original languageEnglish
Pages (from-to)23263-23273
Number of pages11
JournalRSC Advances
Volume12
Issue number36
DOIs
Publication statusPublished - 16 Aug 2022
Externally publishedYes

ASJC Scopus subject areas

  • Chemistry (all)
  • Chemical Engineering (all)

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