CFD modelling of cadmium telluride (CdTe) thin film coating with inline AP-MOCVD

Yiyi Wu, Xiaogang Yang, Xiaobing Huang, Vincent Barrioz, Shafiul Monir, Stuart Irvine, Giray Kartopu

Research output: Chapter in Book/Conference proceedingConference contributionpeer-review

2 Citations (Scopus)

Abstract

A CFD numerical model has been established to study the growth of cadmium telluride (CdTe) on substrate using metalorganic chemical vapour deposition technique in atmospheric pressure (AP-MOCVD) and hydrodynamics in an inline MOCVD reactor. The numerical simulations have been conducted using the CFD code - ANSYS Fluent. Dimethylcadmium (DMCd) and diisopropyltelluride (DIPTe) have been employed as precursors while H2 is acting as the carrier gas. In order to assess the effect of various conditions on CdTe film growth and uniformity, heat transfer and mass transport behaviours of the chemical species in the reactor have been fully investigated. In addition, material utilization and fluid dynamics in the reactor are also discussed.

Original languageEnglish
Title of host publicationAdvanced Materials and Process Technology
Pages1265-1273
Number of pages9
DOIs
Publication statusPublished - 2012
Externally publishedYes
Event2nd International Conference on Advanced Design and Manufacturing Engineering, ADME 2012 - Taiyuan, China
Duration: 16 Aug 201218 Aug 2012

Publication series

NameApplied Mechanics and Materials
Volume217-219
ISSN (Print)1660-9336
ISSN (Electronic)1662-7482

Conference

Conference2nd International Conference on Advanced Design and Manufacturing Engineering, ADME 2012
Country/TerritoryChina
CityTaiyuan
Period16/08/1218/08/12

Keywords

  • AP-MOCVD
  • Cadmium telluride
  • CFD modelling
  • Fluid dynamic
  • Thin film coating

ASJC Scopus subject areas

  • General Engineering

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