TY - JOUR
T1 - AFM峰值力轻敲模式下石墨烯与迈科烯结构稳定性的比较
AU - Chen, Lihang
AU - Cheong, Lingzhi
AU - Shen, Cai
AU - Liu, Zhaoping
N1 - Funding Information:
摇 This work was financially supported by the Zhejiang Natural Science Foundation鄄Taizhou Joint Fund (LTY20B030001).
Funding Information:
This work was financially supported by the Zhejiang Natural Science Foundation-Taizhou Joint Fund (LTY20B030001).
Publisher Copyright:
© 2021, Materials Review Magazine. All right reserved.
PY - 2021/11/25
Y1 - 2021/11/25
N2 - In this paper, the structural stability of graphene and MXene was compared by peak force tapping mode of AFM. When in-situ scanning of two-dimensional material of reduced graphene oxide (rGO), the morphology of rGO did not change with time, which indicated that peak force tapping mode had no damage effect on the stable structure surface; when in-situ scanning of two-dimensional material V2C, nano-etching occurred on the surface of V2C, and the morphology surface area decreased with scanning time. The data processing software was used to analyze the area change and calculate the nano etching rate. It was found that the average nano-etching rate increased with the increase of the peak force, and the etching rate in the atmospheric environment was higher than that in the glove box (Ar atmosphere, the content of H2O and O2 was less than 1×10-6), which indicated that the moisture in the atmosphere had an impact on the stability of the material and would accelerate the nano-etching. This study shows that the peak force tapping mode of AFM can be used to qualitatively characterize the stability of two-dimensional materials.
AB - In this paper, the structural stability of graphene and MXene was compared by peak force tapping mode of AFM. When in-situ scanning of two-dimensional material of reduced graphene oxide (rGO), the morphology of rGO did not change with time, which indicated that peak force tapping mode had no damage effect on the stable structure surface; when in-situ scanning of two-dimensional material V2C, nano-etching occurred on the surface of V2C, and the morphology surface area decreased with scanning time. The data processing software was used to analyze the area change and calculate the nano etching rate. It was found that the average nano-etching rate increased with the increase of the peak force, and the etching rate in the atmospheric environment was higher than that in the glove box (Ar atmosphere, the content of H2O and O2 was less than 1×10-6), which indicated that the moisture in the atmosphere had an impact on the stability of the material and would accelerate the nano-etching. This study shows that the peak force tapping mode of AFM can be used to qualitatively characterize the stability of two-dimensional materials.
KW - In-situ atomic force microscope
KW - Nanolithography
KW - Peak force tapping
KW - Stability
KW - Two-dimensional material
UR - http://www.scopus.com/inward/record.url?scp=85123382996&partnerID=8YFLogxK
U2 - 10.11896/cldb.20070329
DO - 10.11896/cldb.20070329
M3 - 文章
AN - SCOPUS:85123382996
SN - 1005-023X
VL - 35
SP - 22006
EP - 22010
JO - Cailiao Daobao/Materials Review
JF - Cailiao Daobao/Materials Review
IS - 22
ER -