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Simulating the atomic layer deposition of alumina from first principles
Simon D. Elliott,
James C. Greer
Research output
:
Journal Publication
›
Article
›
peer-review
140
Citations (Scopus)
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Keyphrases
Aluminum Oxide
100%
First-principles
100%
Atomic Layer Deposition
100%
Trimethylaluminum
42%
Density Functional Theory
14%
Growth Rate
14%
Desorption
14%
Surface Intermediates
14%
Controlled Growth
14%
Dissociative Adsorption
14%
Hydroxylated
14%
Temperature Affect
14%
Substrate Temperature
14%
Insulating Layer
14%
Deposition Efficiency
14%
Oxide Film
14%
Atomic Structure
14%
Alumina Surface
14%
Flat Screen
14%
Buffer Capacitor
14%
Screen Display
14%
Surface Hydroxylation
14%
Read-write Head
14%
Chemical Vapor Deposition Technique
14%
Display Memory
14%
Material Science
Aluminum Oxide
100%
Density
20%
Desorption
20%
Al2O3
20%
Capacitor
20%
Chemisorption
20%
Oxide Film
20%
Chemical Vapor Deposition
20%
Chemical Engineering
Atomic Layer Deposition
100%
Desorption
14%
Chemisorption
14%
Vapor Deposition
14%
Chemical Vapor Deposition
14%