Predicting mask distortion, clogging and pattern transfer for stencil lithography

Maryna Lishchynska, Victor Bourenkov, Marc A.F. van den Boogaart, Lianne Doeswijk, Juergen Brugger, James C. Greer

Research output: Journal PublicationArticlepeer-review

44 Citations (Scopus)

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Keyphrases

Engineering

Chemical Engineering