Computational design and optimisation of mechanically reinforced masks for stencil lithography

Keyphrases

• Reinforced 100%
• Stencil Lithography 100%
• Stencil 100%
• Computational Design 100%
• Computational Optimization 100%
• Stress-induced 40%
• Stress Effect 40%
• Induced Deformation 40%
• Cantilever 20%
• Nanodevices 20%
• Piezoelectric Materials 20%
• Complex Oxides 20%
• Iterative Design 20%
• Heterostructure 20%
• Epitaxial 20%
• Corrugation 20%
• Pattern Distortion 20%
• Pattern Definition 20%
• Corrugated Structure 20%
• Strategic Placement 20%
• Stencil Design 20%
• Induced Stress 20%
• Stress Design 20%
• Magnetic Complex 20%
• Hydrophobic Patterning 20%

Engineering

• Induced Deformation 100%
• Degrading Effect 100%
• Lithography 100%
• Hydrophobic 50%
• Potential Application 50%
• Piezoelectric Material 50%
• Induced Stress 50%
• Epitaxial Heterostructure 50%

Material Science

• Lithography 100%
• Nanodevice 50%
• Heterojunction 50%
• Oxide Compound 50%
• Piezoelectric Material 50%